| 摘要 |
A retainer ring of a chemical mechanical apparatus according to the present invention includes a top retaining member of a ring shape which is assembled in a polishing head, a bottom retaining member of the ring shape which includes a receiving unit which mounts the top retaining member, an inner race part and an outer race part which are installed on the inner and outer sides of the receiving unit, a plurality of polishing pieces which are in contact with the polishing pad installed on the outer bottom of the inner and outer race parts and the receiving unit, and a contact part which includes at least one heat discharge groove crossing the polishing pieces between the inner race part and the outer race part, and a connection member which is installed between the top retaining member and the bottom retaining member. |
