| 摘要 |
<p>The present invention relates to a plasma source which is arranged in floating fashion on a vacuum chamber wherein the plasma source comprises a source housing and a filament is provided in the source housing and is arranged so as to be insulated therefrom wherein means for measuring the potential drop between the source housing and the filament are provided. The measured potential drop can be used for regulating the voltage heating the filament. According to the invention corresponding means are provided.</p> |
