SUSCEPTOR WITH ARCHED SHAPE GROOVES ON THE SUBSTRATES SUPPORT SURFACE

摘要

The present invention relates to a susceptor for an epitaxial growth reactor; it substantially consists of a body (601) having a face (602) which comprises at least one zone (603) adapted to receive a substrate to be subjected to epitaxial growth; the zone (603) either has or is associated with a resting surface (604) for resting said substrate; the resting surface (604) is provided with patterns which comprise at least three pluralities (605A, 605B, 605C) of arch-shaped grooves (606); in particular, the concavity of said grooves (606) faces towards the edge of the resting surface (604).