FREQUENCY TUNING FOR DUAL LEVEL RADIO FREQUENCY (RF) PULSING

摘要

Methods and apparatus for frequency tuning in process chambers using dual level pulsed power are provided herein. In some embodiments, a method for frequency tuning may include providing a first pulsed power at a first frequency while the first frequency is adjusted to a second frequency, wherein the first frequency is a last known tuned frequency at the first pulsed power, storing the second frequency as the last known tuned frequency at the first pulsed power, providing a second pulsed power at a third frequency while the third frequency is adjusted to a fourth frequency, wherein the first pulsed power and the second pulsed power are different and non-zero, and wherein the third frequency is a last known tuned frequency at the second pulsed power, and storing the fourth frequency as the last known tuned frequency at the second pulsed power.

主权项

1. A method for frequency tuning in process chambers using dual level pulsed power, the method comprising:
providing a first pulsed power at a first frequency by an RF power source for a first period of time while the first frequency is adjusted to a second frequency to achieve a desired impedance at the first pulsed power between the RF power source and a load, wherein the first frequency is a last known tuned frequency at the first pulsed power; storing the second frequency as the last known tuned frequency at the first pulsed power; providing a second pulsed power at a third frequency by the RF power source for a second period of time while the third frequency is adjusted to a fourth frequency to achieve a desired impedance at the second pulsed power between the RF power source and the load, wherein the first pulsed power and the second pulsed power are different and non-zero, and wherein the third frequency is a last known tuned frequency at the second pulsed power; and storing the fourth frequency as the last known tuned frequency at the second pulsed power.