发明名称 COATING APPARATUS
摘要 A coating apparatus includes: a slit nozzle including a retention chamber that retains the coating material; a moving mechanism that moves the slit nozzle; a pressure regulation unit that regulates a pressure inside the retention chamber; and a control unit that controls the moving mechanism and the pressure regulation unit to relatively move the slit nozzle with respect to the substrate while changing the pressure inside the retention chamber toward an atmospheric pressure from a negative pressure, wherein the control unit is configured to control the pressure regulation unit so that a change in the pressure inside the retention chamber in a start zone including a coating start position and an end zone including a coating end position becomes slower than a change in the pressure inside the retention chamber in a middle zone except the start zone and the end zone.
申请公布号 US2015128858(A1) 申请公布日期 2015.05.14
申请号 US201414525502 申请日期 2014.10.28
申请人 Tokyo Electron Limited 发明人 MIMURA Yuji;MAKI Tetsuya;TSURUTA Shigeto;OONISHI Tatsumi;IKEMOTO Daisuke;MASUNAGA Takahiro
分类号 B05B12/02;B05B1/04 主分类号 B05B12/02
代理机构 代理人
主权项 1. A coating apparatus for applying a coating material to a substrate, comprising: a slit nozzle comprising a retention chamber that retains the coating material; a moving mechanism that relatively moves the slit nozzle with respect to the substrate; a pressure regulation unit that regulates a pressure inside the retention chamber; and a control unit that controls the moving mechanism and the pressure regulation unit to relatively move the slit nozzle with respect to the substrate while changing the pressure inside the retention chamber toward an atmospheric pressure from a negative pressure, wherein the control unit is configured to control the pressure regulation unit so that a change in the pressure inside the retention chamber in a start zone including a coating start position and an end zone including a coating end position becomes slower than a change in the pressure inside the retention chamber in a middle zone except the start zone and the end zone.
地址 Tokyo JP