PHOTORESISTS COMPRISING MULTIPLE ACID GENERATOR COMPOUNDS

摘要

PROBLEM TO BE SOLVED: To provide a photoresist composition excellent in LWR, resolution and sensitivity in EUV lithography.SOLUTION: New photoresist compositions comprise (a) a polymer comprising an acid generator bonded thereto; and (b) an acid generator compound that is not bonded to the polymer and that comprises one or more acid-labile groups.