SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSING METHOD

摘要

A substrate liquid processing apparatus includes a tank; a circulation line; a processing unit connected to the circulation line through a branch line and configured to perform a liquid processing on a substrate using a processing liquid flowing through the circulation line; a processing liquid producing mechanism configured to produce the processing liquid by mixing at least two kinds of raw material liquids supplied from respective raw material liquid sources at a controlled mixing ratio; a concentration measuring device configured to measure a concentration of the processing liquid flowing through the circulation line and a concentration of the processing liquid flowing through the processing liquid supply line; and a control device configured to control the processing liquid producing mechanism based on the measured concentrations of the processing liquid.

主权项

1. A substrate liquid processing apparatus comprising:
a tank configured to store a processing liquid obtained by mixing at least two kinds of raw material liquids; a circulation line configured to allow the processing liquid to flow out from the tank and flow back to the tank; a liquid processing unit configured to perform a liquid processing on a substrate using the processing liquid in the tank; a processing liquid producing mechanism configured to produce the processing liquid by mixing the at least two kinds of raw material liquids supplied from respective raw material liquid sources; a processing liquid supply line configured to supply the processing liquid produced by the processing liquid producing mechanism to the tank; a concentration measuring device configured to measure a concentration of the processing liquid flowing through the circulation line and a concentration of the processing liquid flowing through the processing liquid supply line; and a control device configured to control the processing liquid producing mechanism such that the concentration of the processing liquid falls within a predetermined concentration range, based on the concentrations of the processing liquid measured by the concentration measuring device.