发明名称 Motion and Focus Blur Removal from Pattern Images
摘要 A moving wafer imaging system processes wafer images to remove motion and focus blur by performing a blind deconvolution to determine an approximate point spread function. The approximate point spread function, estimated image noise and a Gaussian point spread function are used to compute a weighted point spread function. The weighted point spread function is used to filter out motion focus blur. Noise is then removed with a low-pass filter.
申请公布号 US2015131893(A1) 申请公布日期 2015.05.14
申请号 US201414537535 申请日期 2014.11.10
申请人 KLA-Tencor Corporation 发明人 Sivaraman Ram
分类号 G06T7/00;G06T5/00 主分类号 G06T7/00
代理机构 代理人
主权项 1. A semiconductor wafer inspection method comprising: performing an image capture of a moving wafer with a wafer imaging device; calculating, with a processor, a weighted point spread function based on one or more of an approximate point spread function, a Gaussian point spread function, and an estimated image noise value; and performing, with the processor, a deconvolution on the image based on the weighted point spread function.
地址 Milpitas CA US