发明名称 |
POSITIVE PHOTOSENSITIVE COMPOSITION, THIN FILM TRANSISTOR, AND COMPOUND |
摘要 |
The present invention aims to provide positive photosensitive compositions that have excellent patterning properties and can exhibit excellent electrical insulation reliability when cured (as thin films). The positive photosensitive composition according to a first aspect of the present invention is characterized by including (A) a compound that contains an alkenyl group or a SiH group within a molecule and has a structure that decomposes in the presence of acid to generate an acidic group or a hydroxyl group; (B) a compound that contains a SiH group or an alkenyl group within a molecule; (C) a hydrosilylation catalyst; and (D) a photoacid generator. |
申请公布号 |
EP2871523(A1) |
申请公布日期 |
2015.05.13 |
申请号 |
EP20130812927 |
申请日期 |
2013.07.02 |
申请人 |
KANEKA CORPORATION |
发明人 |
IDE, MASAHITO;INARI, HIROFUMI;KITAJIMA, AKI;TAHARA, KOMEI;MANABE, TAKAO |
分类号 |
G03F7/075;C07F7/18;G03F7/004;G03F7/027;G03F7/039;G03F7/40;H01L51/00;H01L51/05 |
主分类号 |
G03F7/075 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|