发明名称 |
Frequency enhanced impedance dependent power control for multi-frequency RF pulsing |
摘要 |
Methods for processing a substrate in a plasma processing, chamber employing a plurality of RF power supplies. The method includes pulsing at a first pulsing frequency a first RF power supply to deliver a first RF signal between a high power state and a low power state. The method further includes switching the RF frequency of a second RF signal output by a second RF power supply between a first predefined RF frequency and a second RF frequency responsive to values of a measurable chamber parameter. The first RF frequency and the second RF frequencies and the thresholds for switching were learned in advance during a learning phase while the first RF signal pulses between the high power state and low power state at a second RF frequency lower than the first RF frequency and while the second RF power supply operates in different modes. |
申请公布号 |
US9030101(B2) |
申请公布日期 |
2015.05.12 |
申请号 |
US201213621759 |
申请日期 |
2012.09.17 |
申请人 |
Lam Research Corporation |
发明人 |
Valcore, Jr. John C.;Lyndaker Bradford J. |
分类号 |
H01J37/32 |
主分类号 |
H01J37/32 |
代理机构 |
Martine Penilla Group, LLP |
代理人 |
Martine Penilla Group, LLP |
主权项 |
1. A method for processing a substrate in a plasma processing system having at least one plasma processing chamber, said plasma processing chamber employing a plurality of RF power supplies for sustaining a plasma within said plasma processing chamber during said processing, comprising:
pulsing a first RF power supply of said plurality of RF power supplies to deliver a first RF signal between a high power state and a low power state, wherein said pulsing is performed at a first pulsing frequency; and operating a second RF power supply of said plurality of RF power supplies in a fixed frequency mode wherein said second RF power supply is not permitted to self-tune a frequency of a second RF signal output by said second RF power supply and wherein said second RF signal operates with at least two fixed alternate RF frequency values: a first RF frequency value and a second RF frequency value, wherein said first RF frequency value and said second RF frequency value are learned earlier during a learning phase when said second RF power supply operates in a frequency self-tuning mode to self-tune an RF frequency of said second RF signal in response to said first RF signal pulsing between said high power state and said low power state at a second pulsing frequency lower than said first pulsing frequency. |
地址 |
Fremont CA US |