A PHOTO MASK AND THE METHOD OF MAKING THE SAME, THE METHOD OF MAKING TRENCHES BY USING THE PHOTO MASK

摘要

The present invention is to provide a photo mask capable of forming a trench synchronously for preventing a leakage of underfill in a process of forming an opening part of a solder resist. The photo mask comprises: a transparent base material formed with a non-transparent film on one surface; a semi-transparent area formed on the transparent base material by a selective etching by a laser; and a transparent area and a non-transparent area formed on the transparent base material together with the semi-transparent area, thereby forming an opening part of a solder resist, and a trench for preventing a leakage of underfill fluid or an EMC mold by using a photo mask.