SHIELDING UNIT, DEVICE TREATING SUBSTRATE, AND METHOD FOR TREATING SUBSTRATE USING THE SAMES

摘要

The present invention relates to a shielding unit and a method for treating a substrate which make a cleansing process inside a reaction chamber easily take place after a deposition process and remarkably increase a processing rate of cleansing. More specifically, the present invention relates to a shielding unit installed inside the reaction chamber of a substrate treating device for manufacturing a semiconductor device or a display device. The shielding unit is attached to an inner member or an inner wall of the reaction chamber and comprises a plurality of shielding layers, wherein each of the shielding layers can be separated from each other.