发明名称 SUBSTRATE-HOLDING APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 This substrate-holding apparatus is provided with a substrate holder (WH) and a plurality of upwards/downwards-moving pin units (341, 342, 343). The substrate holder (WH) uses suction to hold a substrate (W). One end of each upwards/downwards-moving pin unit (341, 342, 343) has a suction part that applies suction to the bottom surface of the substrate, and in a state in which said suction parts are applying suction to the bottom surface of the substrate (W), the upwards/downwards-moving pin units (341, 342, 343) can move relative to the substrate holder (WH). At least parts of the upwards/downwards-moving pin units (341, 342, 343), including the aforementioned suction parts, are displaced in at least one direction by forces from the substrate (W) to which suction is being applied.
申请公布号 WO2015064613(A1) 申请公布日期 2015.05.07
申请号 WO2014JP78713 申请日期 2014.10.29
申请人 NIKON CORPORATION 发明人 SHIBAZAKI, YUICHI
分类号 H01L21/683;G03F7/20;H01L21/027 主分类号 H01L21/683
代理机构 代理人
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