SEMICONDUCTOR DEVICE AND METHOD FOR FORMING THE SAME

摘要

The present invention relates to a semiconductor device and a method for forming the same and, more specifically, to a technology which forms a storage node contact. The semiconductor device of the present invention comprises: bit lines which are formed on a semiconductor substrate; a support film which is formed in the direction perpendicular to the bit lines; a first storage node contact which is formed on the bottom plate between the bit lines and support film; and a second storage node contact which is formed into a line shape separated by the support film on the first storage node contact and the upper side of the bit lines.