| 摘要 |
The objective has a mirrored entry pupil in a mirrored entry pupil plane obtained by mirroring an entry pupil at an object plane. An illumination ray bundle traverses an illumination system of a microlithography projection exposure apparatus. An image-projecting ray path and the illumination ray bundle do not cross over each other in a meridional plane in a light path from the object plane to an image plane (2102). An intermediate image is formed in the light path from the object plane to the image plane. |
