SUBSTRATE TREATMENT APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus for applying heat treatment to a substrate.SOLUTION: A substrate treatment apparatus comprises: a heat treatment chamber 200 having a heat treatment space for a substrate; a substrate support base 500 to support the substrate in the heat treatment space; and a heating block 100 which comprises heating lamps 300 to generate thermal energy and gas injection ports 400 to inject a gas toward the substrate support base, where the heating lamps and the gas injection ports are placed to face the substrate support base.