发明名称 |
MEMBRANE DESIGN FOR REDUCING DEFECTS IN ELECTROPLATING SYSTEMS |
摘要 |
Certain embodiments disclosed herein pertain to methods and apparatus for electrodepositing material on a substrate. More particularly, a novel membrane for separating the anode from the cathode/substrate, and a method of using such a membrane are presented. The membrane includes at least an ion exchange layer and a charge separation layer. The disclosed embodiments are beneficial for maintaining relatively constant concentrations of species in the electrolyte over time, especially during idle (i.e., non-electroplating) times. |
申请公布号 |
US2015122658(A1) |
申请公布日期 |
2015.05.07 |
申请号 |
US201414256770 |
申请日期 |
2014.04.18 |
申请人 |
Lam Research Corporation |
发明人 |
Kim Doyeon;Ghongadi Shantinath;Takada Yuichi;Huang Ludan;Majid Tariq |
分类号 |
C25D17/00 |
主分类号 |
C25D17/00 |
代理机构 |
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代理人 |
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主权项 |
1. An apparatus for electroplating material onto a substrate, comprising:
a reaction vessel comprising a cathode chamber and an anode chamber, the cathode chamber configured to hold catholyte during electroplating and the anode chamber configured to hold anolyte and an anode during electroplating; a membrane in the reaction vessel separating the cathode chamber from the anode chamber, the membrane comprising an ion exchange layer and a charge separation layer, wherein the charge separation layer is at least about 150 μm thick, and wherein the membrane has a molecular weight cut off between about 200-1500 Da; and a substrate support mechanism for supporting the substrate in the reaction vessel such that the substrate is exposed to the catholyte in the cathode chamber during electroplating. |
地址 |
Fremont CA US |