发明名称 MEMBRANE DESIGN FOR REDUCING DEFECTS IN ELECTROPLATING SYSTEMS
摘要 Certain embodiments disclosed herein pertain to methods and apparatus for electrodepositing material on a substrate. More particularly, a novel membrane for separating the anode from the cathode/substrate, and a method of using such a membrane are presented. The membrane includes at least an ion exchange layer and a charge separation layer. The disclosed embodiments are beneficial for maintaining relatively constant concentrations of species in the electrolyte over time, especially during idle (i.e., non-electroplating) times.
申请公布号 US2015122658(A1) 申请公布日期 2015.05.07
申请号 US201414256770 申请日期 2014.04.18
申请人 Lam Research Corporation 发明人 Kim Doyeon;Ghongadi Shantinath;Takada Yuichi;Huang Ludan;Majid Tariq
分类号 C25D17/00 主分类号 C25D17/00
代理机构 代理人
主权项 1. An apparatus for electroplating material onto a substrate, comprising: a reaction vessel comprising a cathode chamber and an anode chamber, the cathode chamber configured to hold catholyte during electroplating and the anode chamber configured to hold anolyte and an anode during electroplating; a membrane in the reaction vessel separating the cathode chamber from the anode chamber, the membrane comprising an ion exchange layer and a charge separation layer, wherein the charge separation layer is at least about 150 μm thick, and wherein the membrane has a molecular weight cut off between about 200-1500 Da; and a substrate support mechanism for supporting the substrate in the reaction vessel such that the substrate is exposed to the catholyte in the cathode chamber during electroplating.
地址 Fremont CA US