发明名称 GROUP III NITRIDE CRYSTAL GROWING METHOD
摘要 <p>The present invention is to provide a method for growing a group III nitride crystal that has a large size and has a small number of pits formed in the main surface of the crystal by using a plurality of tile substrates. A method for growing a group III nitride crystal includes a step of preparing a plurality of tile substrates 10 including main surfaces 10m having a shape of a triangle or a convex quadrangle that allows two-dimensional close packing of the plurality of tile substrates; a step of arranging the plurality of tile substrates 10 so as to be two-dimensionally closely packed such that, at any point across which vertexes of the plurality of tile substrates 10 oppose one another, 3 or less of the vertexes oppose one another; and a step of growing a group III nitride crystal 20 on the main surfaces 10m of the plurality of tile substrates arranged.</p>
申请公布号 EP2602362(A4) 申请公布日期 2015.05.06
申请号 EP20110814353 申请日期 2011.05.24
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 HIROMURA, YUKI;UEMATSU, KOJI;YOSHIDA, HIROAKI;FUJIWARA, SHINSUKE
分类号 C30B29/38;C30B25/18;C30B25/20;C30B29/40;H01L21/02;H01L21/205 主分类号 C30B29/38
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