发明名称 |
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM |
摘要 |
<p>A pattern forming method contains (i) a step of forming a film by an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a) a repeating unit represented by the specific formula, and (B) a compound capable of generating an organic acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film, and (iii) a step of developing the film by using an organic solvent-containing developer to form a negative pattern.</p> |
申请公布号 |
EP2681623(A4) |
申请公布日期 |
2015.05.06 |
申请号 |
EP20120752967 |
申请日期 |
2012.02.24 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
TAKAHASHI, HIDENORI;YAMAGUCHI, SHUHEI;KATAOKA, SHOHEI;SHIRAKAWA, MICHIHIRO;YOSHINO, FUMIHIRO;SAITOH, SHOICHI |
分类号 |
G03F7/038;G03F7/004;G03F7/039;G03F7/11;G03F7/20;G03F7/32;G03F7/40 |
主分类号 |
G03F7/038 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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