发明名称 |
COMPOSITION RATIO MEASUREMENT USING THE QCM IN EDDC |
摘要 |
The present invention is to provide a composition ratio measurement method using a QCM in a co-evaporation method which measures a composition ratio of a raw material forming a superconducting layer of a superconducting linear element by installing the QCM inside a manufacturing device of the superconducting linear element using a co-evaporation method. To achieve this, a shield comprises: a reaction chamber having a drum wherein a substrate is wound to be rotated; a deposition chamber having a plurality of crucibles vertically arranged in a longitudinal direction of the drum to evaporate a raw material to form a super conducting layer on a substrate; and an opening portion installed between the reaction chamber and the deposition chamber, where it can be opened and closed. In the co-evaporation method using the shield, the QCM is installed in an upper portion of each of the crucibles to measure a deposition rate of a raw material. A method to measure a deposition rate of a raw material comprises: a first step of measuring a deposition rate of the raw material by heating each of the crucibles in a state for the opening portion to be closed; a second step of measuring a deposition rate of the raw material by opening the opening portion; and a third step of measuring a deposition rate of a raw material by closing the opening portion, thereby measuring a composition ratio of the superconducting layer using a proportional relation between each deposition rate of a raw material measured in each step and consumption mass to calculate consumption mass of each raw material in the second step, and the number of atoms of a raw material calculated by the calculated consumption mass. |
申请公布号 |
KR20150047822(A) |
申请公布日期 |
2015.05.06 |
申请号 |
KR20130127776 |
申请日期 |
2013.10.25 |
申请人 |
KOREA ELECTROTECHNOLOGY RESEARCH INSTITUTE |
发明人 |
KIM, HO SUP;HA, DONG WOO;KO, ROCK KIL;SEONG, KI CHUL;OH, SANG SOO |
分类号 |
C23C14/52;C23C14/04;C23C14/24 |
主分类号 |
C23C14/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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