| 发明名称 |
Chemically complex ablative max-phase material and method of manufacture |
| 摘要 |
A MAX-phase material is provided for a cutting tool and other applications. |
| 申请公布号 |
US9023493(B2) |
申请公布日期 |
2015.05.05 |
| 申请号 |
US201113182405 |
申请日期 |
2011.07.13 |
| 申请人 |
|
发明人 |
de Rochemont L. Pierre |
| 分类号 |
B32B15/04;E21B10/46;C23C24/08;C23C28/04 |
主分类号 |
B32B15/04 |
| 代理机构 |
Burns & Levinson LLP |
代理人 |
Burns & Levinson LLP ;Gomes David W. |
| 主权项 |
1. An ablative MAX-phase material having atomic-scale chemical uniformity, comprising M(n−1)AXn (MAX) phase material, where M is the first row transition-metal element, where A is an element from columns III-VI of the periodic table and where X is carbon and/or nitrogen, wherein the material is a crystalline structure with uniformly mixed X-group nanoparticles as an excess secondary phase material formed using a super stoichiometry of X-group precursor materials. |
| 地址 |
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