| 发明名称 | Resist composition and method of forming resist pattern | ||
| 摘要 | A resist composition which generates a base upon exposure and exhibits increased solubility in an alkali developing solution under the action of acid, and the resist composition including: a base component (A) that exhibits increased solubility in an alkali developing solution under the action of acid; an acidic compound component (G1) including a nitrogen-containing cation having a pKa value of 7 or less and a counteranion; and a buffer component (K) including a nitrogen-containing cation and a counteranion being a conjugate base for the acid having a pKa value of 0 to 5. | ||
| 申请公布号 | US9023585(B2) | 申请公布日期 | 2015.05.05 |
| 申请号 | US201313922758 | 申请日期 | 2013.06.20 |
| 申请人 | Tokyo Ohka Kogyo Co., Ltd | 发明人 | Nakamura Tsuyoshi;Yokoya Jiro;Nito Hideto;Shimizu Hiroaki |
| 分类号 | G03F7/004;G03F7/039;G03F7/20;G03F7/30;G03F7/38 | 主分类号 | G03F7/004 |
| 代理机构 | Knobbe Martens Olson & Bear, LLP | 代理人 | Knobbe Martens Olson & Bear, LLP |
| 主权项 | 1. A resist composition which generates a base upon exposure and exhibits increased solubility in an alkali developing solution under the action of acid, the resist composition comprising: a base component (A) that exhibits increased solubility in an alkali developing solution under the action of acid; an acidic compound component (G1) comprising a nitrogen-containing cation having a pKa value of 7 or less and a counteranion; and a buffer component (K) comprising a nitrogen-containing cation and a counteranion being a conjugate base for an acid having a pKa value of 0 to 5. | ||
| 地址 | Kawasaki-shi JP | ||