发明名称 | Liquid crystal display device and method for fabricating the same | ||
摘要 | A liquid crystal display device to reduce damage of signal lines and switching devices caused by electrostatic discharge shock. The liquid crystal display device includes a plurality of pixels defined by intersections between gate lines and data lines, dummy pixels disposed along circumferences of the pixels, common lines disposed parallel to the gate lines, the common lines being connected to the pixels and the dummy pixels, a first gate metal to receive an exterior common voltage, second gate metals that extend from the common lines to one side, the second gate metals having a pad shape, a source-drain metal disposed in a direction parallel to the data lines at one side of the second gate metals, a first connection pattern to electrically connect the first gate metal to the source-drain metal, and a second connection pattern to electrically connect the source-drain metal to the second gate metals. | ||
申请公布号 | US9025099(B2) | 申请公布日期 | 2015.05.05 |
申请号 | US201213688006 | 申请日期 | 2012.11.28 |
申请人 | LG Display Co., Ltd. | 发明人 | Kwon Eun-Mi;Kim Jung-Bum |
分类号 | G02F1/1333;G02F1/1345;G02F1/1362;H01L33/00 | 主分类号 | G02F1/1333 |
代理机构 | Fenwick & West LLP | 代理人 | Fenwick & West LLP |
主权项 | 1. A liquid crystal display device comprising: a plurality of pixels defined by intersections between a plurality of gate lines and a plurality of data lines; a plurality of dummy pixels disposed along a circumference of the plurality of pixels; a plurality of common lines disposed parallel to the plurality of gate lines, the plurality of common lines being connected to the plurality of pixels and the plurality of dummy pixels; a first gate metal to receive an exterior common voltage; a plurality of second gate metals that extend from the plurality of common lines to one side, the plurality of second gate metals having a pad shape; a source-drain metal disposed in a direction parallel to the plurality of data lines at one side of the plurality of second gate metals; a first connection pattern to electrically connect the first gate metal to the source-drain metal; a second connection pattern to electrically connect the source-drain metal to the plurality of second gate metals; a plurality of third gate metals that extend from the plurality of common lines to another side, the plurality of third gate metals having a pad shape; and a third connection pattern to electrically connect the first gate metal to the plurality of third gate metals. | ||
地址 | Seoul KR |