CHAMICAL SUPPLY

摘要

The present invention relates to a chemical supply device. The chemical supply device includes: a chemical supply pipe which supplies a chemical to a tank; a carrier gas supply pipe which supplies carrier gas to the tank to supply the chemical stored in the tank to a main supply pipe; an exhaust pipe which exhausts the carrier gas in the tank when the chemical of the tank is used up; and a damper part which prevents the inflow of overflowed chemical to an exhaust duct and detects the overflow of the chemical when the carrier gas exhausted though the exhaust pipe is connected to the exhaust duct and chemical supplied from the chemical supply pipe is overflowed through the exhaust pipe. A carrier gas exhausted for controlling the pressure of the tank is separated from a chemical remaining in the tank to collect the chemical. Thereby, the leakage of the chemical from the exhaust duct to other equipment can be prevented. The generation of process error can be prevented. The generation of a safety accident due to the leakage of the chemical to the bottom of a room can be prevented.