| 发明名称 |
DETECTION OF PARTICLE CONTAMINATION ON WAFERS |
| 摘要 |
A method of the detection of particle contamination on a semiconductor wafer is provides which includes examining an area of the semiconductor wafer by a metrology system comprising a scatterometry or ellipsometry/reflectometry tool to obtain measured metrology data, comparing the measured metrology data with reference metrology data and determining the presence of particle contamination in the examined area of the semiconductor wafer based on the comparison of the measured metrology data with the reference metrology data. |
| 申请公布号 |
US2015115153(A1) |
申请公布日期 |
2015.04.30 |
| 申请号 |
US201314063531 |
申请日期 |
2013.10.25 |
| 申请人 |
GLOBALFOUNDRIES Inc. |
发明人 |
Urbanowicz Adam Michal;Hartig Carsten;Fischer Daniel |
| 分类号 |
G01N21/95;G01N23/00 |
主分类号 |
G01N21/95 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for detecting contaminating particles on a semiconductor wafer, comprising:
examining an area of the semiconductor wafer by a metrology system comprising a scatterometry, ellipsometry or reflectometry tool to obtain measured metrology data regarding contaminating particles in the area; comparing said measured metrology data with reference metrology data regarding contaminating particles; and determining the presence of at least one contaminating particle in the examined area of said semiconductor wafer based on the comparison of said measured metrology data with said reference metrology data. |
| 地址 |
Grand Cayman KY |
