发明名称 |
Microscopic Imaging Device, Microscopic Imaging Method, and Microscopic Imaging Program |
摘要 |
To provide a microscopic imaging device, a microscopic imaging method, and a microscopic imaging program capable of detecting a focused position through an appropriate method corresponding to the imaging method. In a sectioning observation, a measuring object is irradiated with pattern measurement light, and sectioning image data is generated. In a normal observation, the measuring object is irradiated with uniform measurement light to generate normal image data. Relative positions of an objective lens and the stage are changed a plurality of times in an optical axis direction of the objective lens by a focus position adjustment mechanism. When the sectioning observation is instructed, a focused position is detected based on the value of each piece of pixel data of the sectioning image data. When the normal observation is instructed, a focused position is detected based on a local contrast of the normal image data. |
申请公布号 |
US2015116477(A1) |
申请公布日期 |
2015.04.30 |
申请号 |
US201414481938 |
申请日期 |
2014.09.10 |
申请人 |
Keyence Corporation |
发明人 |
Kang Woobum |
分类号 |
G02B21/06;H04N5/235;H04N5/225 |
主分类号 |
G02B21/06 |
代理机构 |
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代理人 |
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主权项 |
1. A microscopic imaging device comprising:
a light projecting section including at least one light source that emits light, and a pattern applying section configured to generate measurement light with a predetermined pattern from the light emitted from the light source; a stage on which a measuring object is mounted; an optical system that collects the measurement light generated by the light projecting section and irradiates the measuring object on the stage with the measurement light; a light receiving section that receives light from the measuring object, and outputs a light receiving signal indicating a light receiving amount; an image data generating portion that generates image data based on the light receiving signal output from the light receiving section; an instructing section that instructs a first operation mode or a second operation mode; a light projection controller that controls the pattern applying section to generate measurement light with a pattern and to sequentially move a spatial phase of the generated pattern on the measuring object by a predetermined amount, and controls the image data generating portion to generate sectioning image data indicating an image of the measuring object based on a plurality of pieces of image data generated at a plurality of phases of the pattern in the first operation mode, and controls the light projecting section to generate measurement light without a pattern and controls the image data generating portion to generate normal image data indicating an image of the measuring object of when irradiated with the measurement light without a pattern in the second operation mode; a focus controller that changes relative positions of the optical system and the stage in an optical axis direction of the optical system; and a focusing detection portion that detects a focused position based on a plurality of pieces of image data generated by the image data generating portion when the relative positions of the optical system and the stage are changed a plurality of times by the focus controller, wherein the focusing detection portion detects a focused position of each portion of the measuring object based on a value of each pixel of the sectioning image data in the first operation mode, and detects a focused position of each portion of the measuring object based on a local contrast of the normal image data in the second operation mode. |
地址 |
Osaka JP |