| 发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
| 摘要 |
A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid. |
| 申请公布号 |
US2015116675(A1) |
申请公布日期 |
2015.04.30 |
| 申请号 |
US201414584826 |
申请日期 |
2014.12.29 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
JANSEN Hans;BASELMANS Johannes Jacobus Matheus;DONDERS Sjoerd Nicolaas Lambertus;HOOGENDAM Christiaan Alexander;MERTENS Jeroen Johannes Sophia Maria;MULKENS Johannes Catharinus Hubertus;STAVENGA Marco Koert;STREEFKERK Bob;VAN DER HOEVEN Jan Cornelis;GROUWSTRA Cedric Desire |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A lithographic apparatus, comprising:
a substrate table configured to hold a substrate; a projection system configured to project a patterned beam of radiation onto the substrate, the projection system comprising a final optical element adjacent the substrate; a liquid supply system configured to provide a liquid to a space between the projection system and the substrate table; and a cleaning device configured to clean the final optical element, the substrate table, or both. |
| 地址 |
Veldhoven NL |
