Method and assembly for treating a planar material to be treated and device for removing or holding off treatment liquid

摘要

In order to remove treatment liquid (21) from a planar material to be treated (10), which is transported in an assembly for wet-chemical treatment of the material to be treated (10), a retaining surface (4, 14) is provided for holding back the treatment liquid (21). The retaining surface (4, 14) is arranged relative to a transport path of the material to be treated (10) so that a gap (8, 18) remains between the retaining surface (4, 14) and a surface of the material to be treated (10) opposing the retaining surface (4, 14), when the material to be treated (10) is moved past the retaining surface (4, 14). The retaining surface (4, 14) may, for example, be provided as an offset portion of a peripheral surface of a roll (2, 3).

主权项

1. An assembly for treating a planar material to be treated, the assembly being designed to apply on at least one surface of the material to be treated a treatment liquid or to immerse the material to be treated in a treatment liquid, and the assembly being designed to transport the material to be treated along a transport path, the assembly comprising:
a treatment station, which is configured to accumulate the treatment liquid; an application device, which is configured to apply the treatment fluid to the planar material to be treated; a device for removing or holding off treatment liquid from the planar material to be treated, the device being provided in an inflow region of the treatment station, the device comprising a retaining surface for holding back the treatment liquid and being arranged relative to the transport path of the material to be treated so that the device forms a gap between the retaining surface and a surface of the material to be treated transported along the transport path; and a further device for removing or holding off treatment liquid from the planar material to be treated, the further device being provided in an outflow region of the treatment station, the further device comprising a retaining surface for holding back the treatment liquid and being arranged relative to the transport path of the material to be treated so that the further device forms a gap between the retaining surface and the surface of the material to be treated transported along the transport path; the assembly being designed to rotate in opposite directions the retaining surface of the device provided in the inflow region of the treatment station and the retaining surface of the further device provided in the outflow region of the treatment station, wherein the retaining surface of the device provided in the inflow region and the retaining surface of the further device provided in the outflow region which are rotated in opposite directions are both located above a transport plane of the material to be treated, or both located below the transport plane of the material to be treated.