Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

摘要

Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.

主权项

1. A monitoring device for monitoring an arrangement of beam deviating elements positioned in a first plane, the device comprising:
an array of detector elements positioned to receive light from the arrangement of beam deviating elements; an optical system positioned between the arrangement of beam deviating elements and the array of detector elements and configured to image the arrangement of beam deviating elements positioned in the first plane to a second plane; and an array of detector lenses positioned in the second plane, wherein the optical system defines an optical axis that is inclined relative to the first and second planes, and the array of detector elements is positioned in a third plane spaced from and parallel to the second plane.