发明名称 Gas particle formation
摘要 PCT No. PCT/AU91/00546 Sec. 371 Date May 24, 1993 Sec. 102(e) Date May 24, 1993 PCT Filed Nov. 25, 1991 PCT Pub. No. WO92/09360 PCT Pub. Date Jun. 11, 1992A method of gas particle formation in a liquid medium comprising the steps of: forming a substantially continuous film of gas on a surface having a discharge edge submerged in the liquid medium; generating a flow of liquid over the surface, adjacent to and co-current with the film of gas, directed towards the discharge edge; and breaking the gas film into gas particles by shear forces as it approaches and/or escapes from the discharge edge.
申请公布号 US5591328(A) 申请公布日期 1997.01.07
申请号 US19930064108 申请日期 1993.05.24
申请人 ATOMAER PTY. LTD. 发明人 BODNARAS, GEORGE
分类号 B01F3/04;B01F5/00;B01F5/04;B03D1/24;C02F3/20;(IPC1-7):B03D1/24 主分类号 B01F3/04
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