发明名称 Semiconductor light emitting device
摘要 A high luminance semiconductor light emitting device including a metallic reflecting layer formed using a non-transparent semiconductor substrate is provided. The device includes a GaAs substrate; a metal layer disposed on the GaAs substrate; and a light emitting diode structure. The light emitting diode structure includes a patterned metal contact layer and a patterned insulating layer disposed on the metal layer, a p type cladding layer disposed on the patterned metal contact layer and the patterned insulating layer, a multi-quantum well layer disposed on the p type cladding layer, an n type cladding layer disposed on the multi-quantum well layer, and a window layer disposed on the n type cladding layer. The GaAs substrate and the light emitting diode structure are bonded by using the metal layer.
申请公布号 US9018650(B2) 申请公布日期 2015.04.28
申请号 US201314024696 申请日期 2013.09.12
申请人 Rohm Co., Ltd. 发明人 Takao Masakazu;Sakai Mitsuhiko;Senda Kazuhiko
分类号 H01L33/00;H01L33/60;H01L33/04;H01L33/40;H01L33/46;H01L33/06;H01L33/30 主分类号 H01L33/00
代理机构 Rabin & Berdo, P.C. 代理人 Rabin & Berdo, P.C.
主权项 1. A semiconductor light emitting device comprising: a member that includes a GaAs layer; a metal layer disposed above the GaAs layer; and a light emitting diode structure including a patterned layer disposed above the metal layer, a p type cladding layer disposed above the patterned layer, a multi-quantum well layer disposed above the p type cladding layer, an n type cladding layer disposed above the multi-quantum well layer, and a window layer disposed above the n type cladding layer, wherein the GaAs layer and the light emitting diode structure are bonded by using the metal layer, wherein the patterned layer includes a layer of insulation having a predetermined thickness and having a pattern of apertures, the apertures being disposed at a predetermined pitch, wherein the patterned layer additionally includes metal contact members in the apertures of the layer of insulation, the metal contact members having a width in a range from 5 μm to 11 μm and having a height that is substantially the same as the thickness of the layer of insulation, the metal contact members including Au, and wherein the multi-quantum well layer is composed of a multi-quantum well structure formed by laminating a heterojunction pair composed of a GaAs/GaAlAs layer, the layer of insulation being transparent with respect to a light-emitting wavelength from the multi-quantum well layer.
地址 Kyoto JP