POLISHING METHOD AND POLISHING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a polishing method for polishing a substrate while preventing coarse particles from being discharged onto a polishing pad.SOLUTION: A polishing method for polishing a substrate comprises the steps of: causing a polishing liquid to pass through a filter 14 while increasing a physical quantity of the polishing liquid which is one of the flow rate of the polishing liquid and the pressure thereof until it reaches a predetermined set value; and polishing the substrate W on a polishing pad 1 while supplying, onto the polishing pad 1, the polishing liquid passed through the filter 14.