PHOTOSENSITIVE RESIN COMPOSITION, PATTERNED CURED FILM AND PRODUCTION METHOD OF THE SAME, SEMICONDUCTOR ELEMENT, AND ELECTRONIC DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having a high film residual rate after development and excellent mechanical characteristics and thermal characteristics of a patterned cured film formed therefrom, and to provide a patterned cured film and a production method of the patterned cured film using the photosensitive resin composition, a semiconductor element having the patterned cured film as an interlayer insulating layer or a surface protective layer, and an electronic device having the semiconductor element.SOLUTION: The photosensitive resin composition comprises (A) an alkali-soluble resin having a predetermined structural unit, (B) a compound that generates an acid by light, (C) a thermal crosslinking agent, and (D) an acrylic resin having a predetermined structural unit.