| 摘要 |
PROBLEM TO BE SOLVED: To apply an exposure device that controls a longitudinal/lateral error (line width HV difference) in printing line width of an exposure substrate due to a process factor outside the exposure device, especially, a pattern line width drawing error of a mask to within a proper range according to the mask.SOLUTION: Horizontal and vertical line width errors (line width HV differences) of a printing pattern of a photosensitive substrate are measured for each mask according to a pattern drawing region in the mask. According to the pattern drawing region in the mask, a light intensity distribution value of illumination light for correcting the line width HV differences to within a proper range is measured, and the light intensity distribution value is set as a correction parameter to the exposure device. When the photosensitive substrate is exposed by the exposure device, the light intensity distribution value is controlled according to the set correction parameter once the illumination light reaches a pattern drawing region in each mask during scanning exposure so as to control line width HV differences corresponding to the pattern drawing region in the mask to within the proper range. |
