MEASUREMENT METHOD, IMAGE PROCESSING DEVICE, AND CHARGED PARTICLE BEAM APPARATUS

摘要

An error of an outline point due to a brightness fluctuation cannot be corrected by a simple method such as a method of adding a certain amount of offset. However, in recent years as the miniaturization of the pattern represented by a resist pattern has progressed, it has been difficult to appropriately determine a region that serves as a reference. An outline of the resist pattern is extracted from an image of the resist pattern obtained by a charged particle beam apparatus in consideration of influence of the brightness fluctuation. That is, a plurality of brightness profiles in the vicinity of edge points configuring the outline are obtained and an evaluation value of a shape of the brightness profile in the vicinity of a specific edge is obtained based on the plurality of brightness profiles, and the outline of a specific edge point is corrected, based on the evaluation value.

主权项

1. A measurement method for measuring an outline of a pattern from an image of a sample including the pattern obtained by a charged particle beam apparatus, comprising:
a first step of extracting edge points configuring the outline of the pattern; a second step of obtaining a first brightness profile in the vicinity of a first edge point among the edge points; a third step of obtaining a second brightness profile in the vicinity of a second edge point among the edge points; a fourth step of obtaining a third brightness profile in the vicinity of a third edge point among the edge points; a fifth step of obtaining an evaluation value of a shape of the first brightness profile, based on the first brightness profile and the second and third brightness profiles that are obtained; and a sixth step of performing an outline correction of the pattern of the first edge point based on the evaluation value.