发明名称 被露光基板のアライメント補正方法及び露光装置
摘要 An alignment correction method includes: the step of detecting coordinates of a first observation point 14 and a second observation point 15 set in advance on a substrate to be exposed 1 that is being scanned in a scanning direction A, in order to observe an alignment deviation of the substrate to be exposed 1; the step of computing a correction amount based on a deviation between the detected coordinates and a reference line set in advance according to the first observation point 14 and the second observation point 15; and the step of correcting alignment of a subsequent substrate to be exposed 1 based on the computed correction amount.
申请公布号 JP5704606(B2) 申请公布日期 2015.04.22
申请号 JP20110170292 申请日期 2011.08.03
申请人 株式会社ブイ・テクノロジー 发明人 野村 義昭;新井 敏成
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
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