发明名称 Three-dimensional monolithic electronic-photonic integrated circuit
摘要 <p>A three-dimensional monolithic electronic-photonic integrated circuit and a method of manufacturing the same. The electronic-photonic integrated circuit (200) may include a photonic element (260) formed in a sealed space of a substrate and an electronic element (270) formed on the substrate. The substrate may include a first substrate (210) and a second substrate (252) that are bonded to each other. The first substrate (210) having a first trench (212) corresponding to the sealed space formed therein, a first surface of the second substrate (252) having the photonic element formed thereon, and the sealed space defined by a space formed inside the first trench that is sealed by the first surface of the second substrate.</p>
申请公布号 EP2765603(A3) 申请公布日期 2015.04.22
申请号 EP20140154000 申请日期 2014.02.05
申请人 SAMSUNG ELECTRONICS CO., LTD 发明人 CHO, SEONG-HO
分类号 H01L27/00;H01L27/146;H01L31/18 主分类号 H01L27/00
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