发明名称 Methods of forming moisture barrier capacitors in semiconductor components
摘要 Structures and methods of forming moisture barrier capacitor on a semiconductor component are disclosed. The capacitor is located on the periphery of a semiconductor chip and includes an inner plate electrically connected to a voltage node, an outer plate with fins for electrically connecting to a different voltage node.
申请公布号 US9012297(B2) 申请公布日期 2015.04.21
申请号 US201012876866 申请日期 2010.09.07
申请人 Infineon Technologies AG 发明人 Barth Hans-Joachim;Tews Helmut Horst
分类号 H01L21/441;H01L27/08;H01L23/522;H01L23/00;H01L23/58;H01L27/06 主分类号 H01L21/441
代理机构 Slater & Matsil, L.L.P. 代理人 Slater & Matsil, L.L.P.
主权项 1. A method of forming a moisture barrier capacitor, the method comprising: forming an outer plate and an inner plate of the moisture barrier capacitor, the capacitor disposed on a periphery of a chip edge; forming electrical connections to the outer plate of the capacitor to an active circuitry through a upper layer not porous to moisture, wherein the outer plate is electrically connected by fins, wherein at least a portion of the fins are disposed above the inner plate and embedded in the upper layer comprising oxide or nitride region; forming electrical connections to the inner plate of the capacitor to the active circuitry; and forming a moisture barrier structure in the outer plate of the moisture barrier capacitor.
地址 Neubiberg DE