发明名称 |
Methods of forming moisture barrier capacitors in semiconductor components |
摘要 |
Structures and methods of forming moisture barrier capacitor on a semiconductor component are disclosed. The capacitor is located on the periphery of a semiconductor chip and includes an inner plate electrically connected to a voltage node, an outer plate with fins for electrically connecting to a different voltage node. |
申请公布号 |
US9012297(B2) |
申请公布日期 |
2015.04.21 |
申请号 |
US201012876866 |
申请日期 |
2010.09.07 |
申请人 |
Infineon Technologies AG |
发明人 |
Barth Hans-Joachim;Tews Helmut Horst |
分类号 |
H01L21/441;H01L27/08;H01L23/522;H01L23/00;H01L23/58;H01L27/06 |
主分类号 |
H01L21/441 |
代理机构 |
Slater & Matsil, L.L.P. |
代理人 |
Slater & Matsil, L.L.P. |
主权项 |
1. A method of forming a moisture barrier capacitor, the method comprising:
forming an outer plate and an inner plate of the moisture barrier capacitor, the capacitor disposed on a periphery of a chip edge; forming electrical connections to the outer plate of the capacitor to an active circuitry through a upper layer not porous to moisture, wherein the outer plate is electrically connected by fins, wherein at least a portion of the fins are disposed above the inner plate and embedded in the upper layer comprising oxide or nitride region; forming electrical connections to the inner plate of the capacitor to the active circuitry; and forming a moisture barrier structure in the outer plate of the moisture barrier capacitor. |
地址 |
Neubiberg DE |