发明名称 Multilayer moisture barrier
摘要 A moisture barrier, device or product having a moisture barrier or a method of fabricating a moisture barrier having at least a polymer layer, and interfacial layer, and a barrier layer. The polymer layer may be fabricated from any suitable polymer including, but not limited to, fluoropolymers such as polyethylene terephthalate (PET) or polyethylene naphthalate (PEN), or ethylene-tetrafluoroethylene (ETFE). The interfacial layer may be formed by atomic layer deposition (ALD). In embodiments featuring an ALD interfacial layer, the deposited interfacial substance may be, but is not limited to, Al2O3, AlSiOx, TiO2, and an Al2O3/TiO2 laminate. The barrier layer associated with the interfacial layer may be deposited by plasma enhanced chemical vapor deposition (PECVD). The barrier layer may be a SiOxNy film.
申请公布号 US9013018(B2) 申请公布日期 2015.04.21
申请号 US201113579459 申请日期 2011.02.17
申请人 Beneq Oy;U.S. Department of Energy 发明人 Pankow Joel W.;Jorgensen Gary J.;Terwilliger Kent M.;Glick Stephen H.;Isomaki Nora;Harkonen Kari;Turkulainen Tommy
分类号 H01L31/0203;H01L31/048;B32B17/10;H01L31/049 主分类号 H01L31/0203
代理机构 Oliff PLC 代理人 Oliff PLC
主权项 1. A method of forming a moisture barrier comprising: providing a polymer layer; depositing an ALD interfacial layer on the polymer layer; and depositing a barrier layer on the ALD interfacial layer; wherein the interfacial layer is disposed directly between the polymer layer and the barrier layer, and the barrier layer comprises a SiOxNy film.
地址 Vantaa FI