发明名称 |
Nonvolatile semiconductor memory element, nonvolatile semiconductor memory, and method for operating nonvolatile semiconductor memory element |
摘要 |
According to an aspect of the present invention, there is provided a nonvolatile semiconductor memory element including: a semiconductor substrate including: a source region; a drain region; and a channel region; a lower insulating film that is formed on the channel region; a charge storage film that is formed on the lower insulating film and that stores data; an upper insulating film that is formed on the charge storage film; and a control gate that is formed on the upper insulating film, wherein the upper insulating film includes: a first insulting film; and a second insulating film that is laminated with the first insulating film, and wherein the first insulating film is formed to have a trap level density larger than that of the second insulating film. |
申请公布号 |
US9012978(B2) |
申请公布日期 |
2015.04.21 |
申请号 |
US201314015708 |
申请日期 |
2013.08.30 |
申请人 |
Kabushiki Kaisha Toshiba |
发明人 |
Shingu Masao;Fujiki Jun;Yasuda Naoki;Muraoka Koichi |
分类号 |
H01L29/66;H01L29/792;H01L21/28;H01L29/51;G11C11/40 |
主分类号 |
H01L29/66 |
代理机构 |
Oblon, McClelland, Maier & Neustadt, L.L.P. |
代理人 |
Oblon, McClelland, Maier & Neustadt, L.L.P. |
主权项 |
1. A nonvolatile semiconductor memory element comprising:
a semiconductor substrate; a lower insulating film that is disposed on the semiconductor substrate; a charge storage film that is disposed on the lower insulating film; an upper insulating film that is disposed on the charge storage film; and a control gate that is disposed on the upper insulating film; wherein the upper insulating film includes:
a first insulating film having a thickness of 4 nm or less;a second insulating film that is disposed on the first insulating film; anda third insulating film that is disposed on the second insulating film, wherein the third insulating film is an SiO2 film, and wherein a thickness of the first insulating film is thinner than that of the third insulating film. |
地址 |
Minato-ku JP |