Individual mirror for constructing a faceted mirror, in particular for use in a projection exposure system for microlithography

摘要

An individual mirror is used to construct a facet mirror. A mirror body of the individual mirror is configured to be tiltable relative to a rigid carrier body about at least one tilting axis of a tilting joint. The tilting joint is configured as a solid-body joint. The solid-body joint, perpendicular to the tilting axis, has a joint thickness S and, along the tilting axis, a joint length L. The following applies: L/S>50. The result is an individual mirror to construct a facet mirror, which can be reproduced and is precisely adjustable and simultaneously ensures adequate heat removal, in particular, heat produced by residually absorbed useful radiation, which is reflected by the individual mirror, by dissipation of the heat by the mirror body.

主权项

1. A system, comprising:
a mirror configured to be used in a microlithography facet mirror, the mirror comprising:
a rigid carrier body; anda mirror body configured to be tiltable relative to the rigid carrier body about a tilting axis; and an actuator configured to control tilting of the mirror body about the tilting axis, the actuator comprising:
a first joint body;a second joint body;a movement electrode movably connected to the first joint body;a counter-electrode rigidly connected to the second joint body; anda dielectric between the movement electrode and the counter-electrode, wherein:
in a contact face portion, the movement electrode contacts the dielectric layer;in a spacing face portion, a continuously increasing space is present between the movement electrode and the counter-electrode in a force-free state;when the mirror body is tilted in a first position about the tilting axis, the contact face portion has a first area which is a total area of contact between the movement electrode and the dielectric layer;when the mirror body is titled in a second position about the tilting axis, the contact face portion has a second area which is a total area of contact between the movement electrode and the dielectric layer;the first position is different from the second position;the first area is different from the second area; andthe movement electrode is connected to the first joint body in the spacing face portion.