发明名称 |
Measurement apparatus, information processing apparatus, information processing method, and storage medium |
摘要 |
A measurement apparatus includes a projection unit configured to project pattern light onto an object to be measured, an imaging unit configured to capture an image of the object to be measured on which the pattern light is projected to acquire a captured image of the object to be measured, a measurement unit configured to measure a position and/or orientation of the object to be measured on the basis of the captured image, a position and orientation of the projection unit, and a position and orientation of the imaging unit, a setting unit configured to set identification resolution of the pattern light using a range of variation in the position and/or orientation of the object to be measured; and a change unit configured to change a pattern shape of the pattern light in accordance with the identification resolution. |
申请公布号 |
US9014433(B2) |
申请公布日期 |
2015.04.21 |
申请号 |
US201313738351 |
申请日期 |
2013.01.10 |
申请人 |
Canon Kabushiki Kaisha |
发明人 |
Kobayashi Kazuhiko;Fujiki Masakazu;Uchiyama Shinji;Tateno Keisuke |
分类号 |
G06T7/00;G01B11/00;G01B11/25 |
主分类号 |
G06T7/00 |
代理机构 |
Canon USA Inc. IP Division |
代理人 |
Canon USA Inc. IP Division |
主权项 |
1. A measurement apparatus comprising:
a holding unit configured to hold model information of a target object; an image obtaining unit configured to obtain an image including the target object; a first obtaining unit configured to obtain an approximate position and/or an orientation of the target object included in the image; a second obtaining unit configured to obtain a range of variation in the obtained approximate position and/or orientation of the target object; a first determination unit configured to determine a target range which the target object can take in the image, by projecting the model information onto the image based on the range of variation in the obtained approximate position and/or orientation, obtained by the second obtaining unit, and the approximate position and/or orientation, obtained by the first obtaining unit; and a second determination unit configured to determine a pattern based on the determined target range. |
地址 |
Tokyo JP |