| 发明名称 |
METHOD OF MANUFACTURING LIQUID CRYSTAL DISPLAY DEVICE |
| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method of manufacturing a liquid crystal display device capable of suppressing the reduction in an etching rate of metal wiring.SOLUTION: A method of manufacturing a liquid crystal display device includes: a step S501 for carrying a substrate having a Ti/Al-Si/Ti metal film into a chamber of a dry etching device; steps (S505, S506) for making reaction gas containing chlorine into plasma and etching and processing the metal film; and a step S507-1 for supplying oxygen gas while vacuum-sucking the inside of a chamber and purging oxygen for 20 seconds at a pressure equal to or less than 1.3 Pa.</p> |
| 申请公布号 |
JP2015076487(A) |
申请公布日期 |
2015.04.20 |
| 申请号 |
JP20130211331 |
申请日期 |
2013.10.08 |
| 申请人 |
JAPAN DISPLAY INC |
发明人 |
NAKAMURA TAKAO;KARIKOMI OSAMU |
| 分类号 |
H01L21/3065;H01L21/3213;H01L21/336;H01L21/768;H01L29/786 |
主分类号 |
H01L21/3065 |
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