PRODUCTION METHOD OF RESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a production method of a resist composition, by which a resist composition with reduced coating defects can be produced.SOLUTION: A production method of a resist composition to be used for a process of manufacturing a semiconductor device is provided, which includes steps of: cleaning an apparatus for producing the resist composition with a cleaning solution; extracting the cleaning solution from the production apparatus and analyzing; further cleaning the apparatus until a concentration of a nonvolatile component included in the cleaning solution is decreased to 10 ppm or lower; and then producing the resist composition in the production apparatus.