具有气封之化学沉积室;CHEMICAL DEPOSITION CHAMBER HAVING GAS SEAL

摘要

本发明揭露一种用以密封化学沉积设备中之处理区域的系统，该系统包括：一化学隔离腔室，具有形成在化学隔离腔室内的沉积腔室；一喷淋头模组，具有一面板，该喷淋头模组包括复数入口及排出口，该等入口将反应器化学物质递送至一腔体以供处理半导体基板，该等排出口将反应器化学物质及惰性气体自腔体移除，以及一外侧气室系配置以递送惰性气体；一基座模组，配置以支撑基板，且垂直移动以利用一狭缝来封闭该腔体，狭缝介于基座模组与围绕在面板的外侧部份的台阶之间；以及一惰性密封气体馈送器，配置以将惰性密封气体馈送到外侧气室内，且其中惰性密封气体至少部份径向朝内流过狭缝而形成气体密封。; a showerhead module having a faceplate, the showerhead module including a plurality of inlets which deliver reactor chemistries to a cavity for processing semiconductor substrates and exhaust outlets which remove reactor chemistries and inert gases from the cavity, and an outer plenum configured to deliver an inert gas; a pedestal module configured to support a substrate and which moves vertically to close the cavity with a narrow gap between the pedestal module and a step around an outer portion of the faceplate; and an inert seal gas feed configured to feed the inert seal gas into the outer plenum, and wherein the inert seal gas flows radially inwardly at least partly through the narrow gap to form a gas seal.