发明名称 |
FIELD EFFECT COMPOUND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME |
摘要 |
<p>PROBLEM TO BE SOLVED: To allow a cross-sectional shape of a gate electrode to be a precise step shape having a left-right symmetrical structure containing a smooth tapered side wall, relating to a field effect compound semiconductor device and its manufacturing method.SOLUTION: On a lamination structure containing a gallium nitride based channel layer/gallium nitride based carrier supply layer provided on a substrate, a multilayer structure film is provided which is made from two or more layers of an insulating film having difference in composition or density from each other, to form a gate opening part having a shape of left-right symmetrical structure that contains a step according to the number of layers of multilayer structure film.</p> |
申请公布号 |
JP2015072962(A) |
申请公布日期 |
2015.04.16 |
申请号 |
JP20130206961 |
申请日期 |
2013.10.02 |
申请人 |
TRANSPHORM JAPAN INC |
发明人 |
KIUCHI KENJI;HOSODA TSUTOMU |
分类号 |
H01L21/338;H01L21/28;H01L21/318;H01L21/336;H01L29/06;H01L29/423;H01L29/49;H01L29/778;H01L29/78;H01L29/812 |
主分类号 |
H01L21/338 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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