发明名称 FIELD EFFECT COMPOUND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 <p>PROBLEM TO BE SOLVED: To allow a cross-sectional shape of a gate electrode to be a precise step shape having a left-right symmetrical structure containing a smooth tapered side wall, relating to a field effect compound semiconductor device and its manufacturing method.SOLUTION: On a lamination structure containing a gallium nitride based channel layer/gallium nitride based carrier supply layer provided on a substrate, a multilayer structure film is provided which is made from two or more layers of an insulating film having difference in composition or density from each other, to form a gate opening part having a shape of left-right symmetrical structure that contains a step according to the number of layers of multilayer structure film.</p>
申请公布号 JP2015072962(A) 申请公布日期 2015.04.16
申请号 JP20130206961 申请日期 2013.10.02
申请人 TRANSPHORM JAPAN INC 发明人 KIUCHI KENJI;HOSODA TSUTOMU
分类号 H01L21/338;H01L21/28;H01L21/318;H01L21/336;H01L29/06;H01L29/423;H01L29/49;H01L29/778;H01L29/78;H01L29/812 主分类号 H01L21/338
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