High Voltage Isolation of an Inductively Coupled Plasma Ion Source with a Liquid that is not Actively Pumped

摘要

An inductively-coupled plasma source for a focused charged particle beam system includes a plasma chamber and a fluid that is not actively pumped surrounding the plasma chamber for providing high voltage isolation between the plasma chamber and nearby parts which are at ground potential, such as a conductive shield. One or more cooling devices cool the plasma chamber by using evaporative cooling and heat pipes to dissipate the heat from the plasma chamber into a surrounding environment.

主权项

1. A charged particle beam system, comprising:
a plasma source having:
a plasma chamber having a wall composed of a dielectric material, the wall having an interior surface and an exterior surface;a conductor coiled at least one time around the plasma chamber;a fluid surrounding and in thermal contact with at least a portion of the plasma chamber, in which the fluid is not actively pumped; anda source electrode for electrically biasing the plasma to a high voltage; and one or more focusing lenses for focusing charged particles from the plasma source onto a sample.