发明名称 半導体プロセスチャンバ内において使用するための物品
摘要 <p>PURPOSE: A surface texturizing method is provided to enhance adhesive strength of an inner surface of a process chamber by reducing contamination due to particles condensed thereon. CONSTITUTION: A scanning process is performed to scan an electromagnetic beam across a surface of a component for a sufficient period of time to form a plurality of features thereon(804). A roughening process is performed to roughen the surface and features of the component(806,808). The scanning process includes a transit time and a dwell time. The electromagnetic beam has a power density at a point on the surface of the component upon which the beam is directed in a range of about 10¬4W/mm¬2 to about 10¬7W/mm¬2.</p>
申请公布号 JP5703262(B2) 申请公布日期 2015.04.15
申请号 JP20120138357 申请日期 2012.06.20
申请人 发明人
分类号 B24C11/00;H01L21/02;B23K15/00;C23F1/00;C23F4/00;H01L21/00;H01L21/205;H01L21/3065 主分类号 B24C11/00
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