| 摘要 |
<p>A tracking-type laser interferometer in which a pattern emission control unit controls a changing mechanism such that light is emitted along a predetermined pattern when judged by a first judgment unit that at least one of received-light amounts at first and second light reception units is not greater than a first threshold value. A tracking control unit causes the changing mechanism to keep track of a retro reflector when judged by a second judgment unit that both of the received-light amounts at the first and second light reception units are greater than second threshold values during a time period in which the pattern emission control unit controls the changing mechanism for the emission of light along the pattern. The interferometer emits light along the pattern to search for the retro reflector upon losing sight thereof. Upon detection, the interferometer can keep track of the reflector again and resume measurement.</p> |
