| 摘要 |
<p>Provided is a method capable of producing an electromagnetic wave reflective film which has a configuration of plural selective reflection layers being laminated so as to be in direct contact, and has a small proportion of diffuse reflection in the selectively reflected light. Disclosed is a method for producing an electromagnetic wave reflective film, the method comprising steps of: a first selective reflection layer forming process of: using a transparent substrate; applying a first selective reflection layer forming coating solution on the transparent substrate to form a first selective reflection layer forming layer; irradiating the first selective reflection layer forming layer with ultraviolet rays at a dose in the range of 25 mJ/cm 2 to 800 mJ/cm 2 ; and thereby forming a first selective reflection layer; and a second selective reflection layer forming process of: using a second selective reflection layer forming coating solution; applying the second selective reflection layer forming coating solution on the first selective reflection layer so as to be in direct contact therewith to form a second selective reflection layer forming layer; irradiating the second selective reflection layer forming layer with ultraviolet rays; and thereby forming a second selective reflection layer.</p> |
